| 2011 | J. Schulze, E. Schüngel, U. Czarnetzki, and T. Mussenbrock: Making a geometrically asymmetric
capacitive rf discharge electrically symmetric. In: Applied Physics Letters, 2011, 031501 |
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| 2011 | E. Schüngel, J. Schulze, Z. Donko, and U. Czarnetzki: Power absorption in electrically asymmetric
dual frequency capacitive radio frequency discharges. In: Physics of Plasmas, 2011, 013503 |
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| 2011 | U. Czarnetzki, J. Schulze, E. Sch¨ungel, and Z. Donko: The Electrical Asymmetry Effect in
capacitively coupled radio frequency discharges. In: Plasma Sources Science and Technology, 2011, 024010 |
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| 2011 | J. Schulze, E. Schüngel, Z. Donko, and U. Czarnetzki: The Electrical Asymmetry Effect in
multi-frequency capacitively coupled radio frequency discharges. In: Plasma Sources Science and
Technology, 2011, 015017 |
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| 2010 | J. Schulze, E. Schüngel, Z. Donko, and U. Czarnetzki: Charge dynamics in capacitively
coupled radio frequency discharges. In: Journal of Physics D: Applied Physics, 2010, 225201 |
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| 2010 | J. Schulze, E. Schüngel, Z. Donko, and U. Czarnetzki: Excitation dynamics in electrically
asymmetric capacitively coupled radio frequency discharges: experiment, simulation, and
model. In: Plasma Sources Science and Technology, 2010, 045028 |
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| 2010 | J. Schulze, E. Schüngel, Z. Donko, D. Luggenhölscher, and U. Czarnetzki: Phase resolved
optical emission spectroscopy: a non-intrusive diagnostic to study electron dynamics in capacitive
radio frequency discharges. In: Journal of Physics D: Applied Physics, 2010, 124016 |
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| 2010 | Z. Donko, J. Schulze, P. Hartmann, I. Korolov, U. Czarnetzki, and E. Schüngel: The effect
of secondary electrons on the separate control of ion energy and flux in dual-frequency
capacitively coupled radio frequency discharges. In: Applied Physics Letters, 2010, 081501 |
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| 2010 | D. Ziegler, J. Trieschmann, T. Mussenbrock, R. P. Brinkmann, J. Schulze, U. Czarnetzki, E. Semmler, P. Awakowicz, D. OConnell, T. Gans: The influence of the relative phase between
the driving voltages on electron heating in asymmetric dual frequency capacitive discharges. In: Plasma Sources Science and Technology, 2010, 045001 |
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| 2009 | J. Schulze, Z. Donko, D. Luggenhölscher, and U. Czarnetzki: Different modes of electron
heating in dual-frequency capacitively coupled radio frequency discharges. In: Plasma Sources
Science and Technology, 2009, 034011 |
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| 2009 | J. Schulze, E. Schüngel, U. Czarnetzki, and Z. Donko: Optimization of the Electrical Asymmetry
Effect in dual-frequency capacitively coupled radio frequency discharges - Experiment,
simulation, and model. In: Journal of Applied Physics, 2009, 063307 |
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| 2009 | Z. Donko, J. Schulze, B. G. Heil, and U. Czarnetzki: PIC simulations of the separate control
of ion flux and energy in CCRF discharges via the Electrical Asymmetry Effect. In: Journal of
Physics D: Applied Physics, 2009, 025205 |
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| 2009 | Z. Donko, J. Schulze, U. Czarnetzki, and D. Luggenhölscher: Self-excited non-linear plasma
series resonance oscillations in geometrically symmetric capacitively coupled radio frequency
discharges. In: Applied Physics Letters, 2009, 131501 |
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| 2009 | U. Czarnetzki, B. G. Heil, J. Schulze, Z. Donko, T. Mussenbrock, and R. P. Brinkmann: The
Electrical Asymmetry Effect - A novel and simple method for separate control of ion energy
and flux in capacitively coupled RF discharges. In: Journal of Physics: Conference Series, 2009, 012010 |
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| 2009 | J. Schulze, E. Schüngel, and U. Czarnetzki: The Electrical Asymmetry Effect in capacitively
coupled radio frequency discharges - Measurements of DC self bias, ion energy, and ion flux. In: Journal of Physics D: Applied Physics, 2009, 092005 |
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| 2008 | J. Schulze, Z. Donko, B. G. Heil, D. Luggenhölscher, T. Mussenbrock, R. P. Brinkmann,
and U. Czarnetzki: Electric Field Reversals in the sheath region of capacitively coupled radio
frequency discharges at different pressures. In: Journal of Physics D: Applied Physics, 2008, 105214 |
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| 2008 | J. Schulze, B. G. Heil, D. Luggenhölscher, T. Mussenbrock, R. P. Brinkmann, and U.
Czarnetzki: Electron beams in asymmetric capacitively coupled RF discharges at low pressures. In: Journal of Physics D: Applied Physics, 2008, 042003 |
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| 2008 | J. Schulze, B. G. Heil, D. Luggenhölscher, and U. Czarnetzki: Electron beams in capacitively
coupled RF discharges. In: IEEE Transactions on Plasma Science, 2008, 1400 |
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| 2008 | J. Schulze, D. Luggenhölscher, and U. Czarnetzki: Instabilities in capacitively coupled RF
discharges. In: IEEE Transactions on Plasma Science, 2008, 1402 |
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| 2008 | B. G. Heil, J. Schulze, T. Mussenbrock, R. P. Brinkmann, and U. Czarnetzki: Numerical
Modeling of Electron Beams Accelerated by the Radio Frequency Boundary Sheath. In: IEEE
Transactions on Plasma Science, 2008, 1404 |
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| 2008 | J. Schulze, B. G. Heil, D. Luggenhölscher, R. P. Brinkmann, and U. Czarnetzki: Stochastic
heating in asymmetric capacitively coupled RF discharges. In: Journal of Physics D: Applied
Physics, 2008, 195212 |
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| 2007 | J. Schulze, T. Kampschulte, D. Luggenhölscher, and U. Czarnetzki: Diagnostics of the
Plasma Series Resonance effect in radio-frequency discharges. In: Journal of Physics: Conference
Series, 2007, 012010 |
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| 2007 | T. Kampschulte, J. Schulze, D. Luggenh¨olscher, M. D. Bowden, and U. Czarnetzki: Laser
spectroscopic electric field measurement in krypton. In: New Journal of Physics, 2007, 18 |
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| 2007 | J. Schulze, T. Gans, D. OConnell, U. Czarnetzki, A. R. Ellingboe, and M. M. Turner: Space
and phase resolved plasma parameters in an industrial dual-frequency capacitively coupled
radio-frequency discharge. In: Journal of Physics D: Applied Physics, 2007, 7008 |
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| 2006 | T. Gans, J. Schulze, D. OConnell, U. Czarnetzki, R. Faulkner, A. R. Ellingboe, and M. M. Turner: Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas. In: Applied Physics Letters, 2006, 261502 |
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| 2005 | T. Kampschulte, J. Schulze, T. Gans, U. Czarnetzki, S. Marke, and T. Wallendorf: Phase and space resolved optical emission spectroscopic investigations of an inductively coupled RF plasma using an imaging acousto-optic spectrometer. In: Surface and Coatings Technology, 2005, 859 |
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