| 2018 | Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Yu Jin Kim, Taehwan Moon, Keum Do Kim, Seung Dam Hyun, Thomas Mikolajick, Uwe Schroeder, Cheol Seong Hwang: Understanding the formation of the metastable
ferroelectric phase in hafniazirconia solid
solution thin films. In: Nanoscale, 2018, 716-725 |
|---|
| 2017 | Min Hyuk Park, Tony Schenk, Michael Hoffmann, Steve Knebel, Jan Gärtner, Thomas Mikolajick, Uwe Schroeder: Effect of Acceptor Doping on Phase Transitions of HfO2 Thin Films for Energy-Related Applications. In: Nano Energy, 2017, 381-389 |
|---|
| 2017 | Maxim Kozodaev, Anna Chernikova, Evgeny Korostylev, Min Hyuk Park, Uwe Scrhroeder, Cheol Seong Hwang, Andrey Markeev: Ferroelectric properties of lightly doped La:HfO2 thin films grown by plasma-assisted atomic layer deposition. In: Applied Physics Letters, 2017, 132903 |
|---|
| 2017 | Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Tony Schenk, Keum Do Kim, Thomas Mikolajick, Uwe Schroeder, Cheol Seong Hwang: Ferroelectricity in Nanoscale HfO2-ZrO2 Solid Solution: Comparison between Surface Energy Model and Experimental Observations. In: Nanoscale, 2017, 9973-9986 |
|---|
| 2017 | Terence Mittmann, Franz P. G. Fengler, Claudia Richter, Min Hyuk Park, Thomas Mikolajick, Uwe Schroeder: Optimizing process conditions for improved Hf1?xZrxO2 ferroelectric capacitor performance. In: Microelectronic Engineering, 2017, 48-51 |
|---|
| 2017 | C. Richter, T. Schenk, M. H. Park, F. A. Tscharnkte, E. D. Grimley, J. M. LeBeau, C. Zhou, J. L. Jones, T. Mikolajick, U. Schroeder: Si Doped HfO2 - A Fragile Ferroelectric System. In: Advanced Electronic Materials, 2017, 1700131 |
|---|
