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Profile
| Academic position | Full Professor |
|---|---|
| Research fields | Preparative and Physical Chemistry of Polymers |
| Keywords | CVD, block copolymers, lithography, microelectronics, biomaterials |
Current contact address
| Country | United States of America |
|---|---|
| City | Ithaca |
| Institution | Cornell University |
| Institute | Materials Science & Engineering Department |
| Homepage | www.ccmr.cornell.edu/~cober/ |
Host during sponsorship
| Prof. Dr. Gerhard Wegner | Abteilung Chemie der Polymere, Max-Planck-Institut für Polymerforschung, Mainz |
|---|---|
| Prof. Dr. Georg Krausch | Lehrstuhl für Physikalische Chemie II, Universität Bayreuth, Bayreuth |
| Prof. Dr. Hans-Werner Schmidt | Lehrstuhl für Makromolekulare Chemie I, Universität Bayreuth, Bayreuth |
| Prof. Dr. Jürgen Rühe | Institut für Mikrosystemtechnik (IMTEK), Albert-Ludwigs-Universität Freiburg, Freiburg |
| Start of initial sponsorship | 01/07/1993 |
Programme(s)
| 1993 | Humboldt Research Fellowship Programme |
|---|---|
| 2006 | Humboldt Research Award Programme |
Nominator's project description
| Professor Ober is one of the very active international leaders in the field of applied polymer materials science. He has made significant contributions in the field of liquid crystalline polymers, block copolymers and lithographic processes. Professor Ober's recent fundamental studies on the convergence of self-assembly and photolithographic processes are expected to have future impact on applications in photonics, nanotechnology and biotechnology. While in Germany, he conducts in the area of novel lithographic processes for complex nanostructures. |
Publications (partial selection)
| 2008 | Frauke Pfeiffer, Nelson M. Felix, Christian Neuber, Christopher K. Ober, and Hans-Werner Schmidt: Towards Environmentally Friendly, Dry Deposited, Water Developable Molecular Glass Photoresists. In: Physical Chemistry Chemical Physics, 2008, 1257-1262 |
|---|---|
| 2007 | Frauke Pfeiffer, Nelson Felix, Christian Neuber, Christopher K. Ober, Hans-Werner Schmidt,: Physical Vapor Deposition of Chemically Amplified Photoresists: A New Route to Patterning Molecular Glass Resists. In: Advanced Functional Materials, 2007, 2336-2342 |