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Current contact address
| Country | People's Republic of China |
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| City | Shanghai |
| Institution | Fudan University |
| Institute | Department of Microelectronics |
Profile
| Research fields | Electronic Semiconductors, Components and Circuits, Integrated Systems, Sensor Technology, Theoretical Electrical Engineering,Materials Engineering |
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| Keywords | Atomic layer deposition (ALD) technique, Non-volatile memory technology, High-k dielectric/Metal gate stack, Low-k material and copper integration, MIM capacitors for RF and mixed signal application |